Detailed Product Description
This machine is a sputtering vacuum coater, its vacuum chamber with small-scale pre-open door and box-type structure, the vacuum chamber size: dia.400mmX400mm. Ultimate Vacuum: 2X10-4Pa.
Main configurations: a dia.240mm large planar magnetron sputtering target, the target has more than one magnet, sputtering constantly rotating in order to improve target utilization and improve the uniformity of the substrate film; equipped with both RF and DC Two magnetron sputtering power supply for 1000Ws; substrate baking temperature can be up to 650 . The machine can coat a variety of films, including the feature film. It equipped with F-250 molecular pump and 2ZD-15 Direct mechanical pump.
The apparatus available be used for education and scientific research.for universities, research institutes and factories .
