Detailed Product Description
vacuum machine------JCP450 Magnetron sputtering series equipment,The main series of DC / non-symmetric bipolar pulse / RF magnetron sputtering, vapor deposition and other functions, a multi-purpose can be realized. Mainly used in metal film, the semiconductor film, compound film, film, media, multilayer, magnetic coating.
Appellation | JCP450 Vacuum Coating Equipment Series | ||
type | A type | B type | C type |
Coating mode | DC magnetron sputtering | Three-target sputtering | RF / DC magnetron sputtering+ evaporation*2 |
film types | Metal Film | Metal films, reaction film, magnetic film, multilayer film | Metal film dielectric film, reaction film, oxide film |
Power type | 2000W DC*1 | 1000W Bipolar Pulse Generator*3 | 500W DC*1 500W RF*1 500 Evaporation constant current source*1 |
Sputtering target structure | Permanent magnetic target*2 sizeΦ100mm | Permanent magnetic target*3 sizeΦ76.2mm | Permanent magnetic target*3 sizeΦ50.8mm One pair of Evaporation electrodes |
Vacuum chamber structure | Vertical structure from top to bottom after the ventilation system, manually open-air mention spring | ||
Base pressure | 6×10-5Pa(Molecular pump)6×10-4PaDiffusion pump | ||
Vacuum system components | Molecular pump / diffusion pump+ mechanical pumps | ||
Pumping speed | less than or equal to 20min from the air to 10-3Pa | ||
membrane uniformity | ≤±5% | ||
Workpiece baking temperature | Adjustable controlled room temperature to 500 ° C (PID Temperature Control) | ||
Workpiece operation mode | Public rotation, 0~20rpm, adjustable controlled CVT | ||
Vacuum measurement | Digital composite vacuum gauge | ||
Vacuum control | A BC type Manual or PLC Automatic Control | ||
gas control | 2/3 sets of gas control system,customers can also special requirements | ||
Workpiece cleaning method | anti - splash Cleaning | ||
protection | Equipment is being driven, under compaction, flow, over-voltage protection devices | ||
power | ≥12KW,area10m2. | ||
Option devices | Quartz oscillator thickness devices Hall ion source, cooling water circulating machines, Bias voltage | ||
