1.high purity, SiO2:99.9% 2. low ion impurities, 3.stable particle size distributions, 4.low price,
Fused Silica is produced by fusing and transforming crystalline silica at 1700ºC-2500ºC high temperature into amorphous silica. it is widely used in electronic industry and high-temperature refractories.
Application:solar crucible, the matarial of fused silica powder, quartz glass handicraft, quartz glass tube, etc.
SPECIFICATIONS:
SIO2 – 99.9% MIN , AL2O3 – 500PPM MAX
FE2O3 – 30PPM MAX ,K2O – 50PPM MAX
NA2O – 50PPM MAX,
Size: 0-3cm, 0-5cm, 0.1-6mm, 20-40mesh,20-40mesh ,125mesh, 200mesh, 325mesh,etc.
or according to your requirements.
fused silica
