Tantalum sputtering target, Tantalum disc Grade: RO5200,RO5252,RO5255 Standard ASTM B 708-98 Purity: 99.95% or 99.99%
We are factory specializing in the manufacture and export Tantalum and Niobium prodcut for more than ten years,Including foil tube ,rod,wire,sheet,plate, ,rod,strip,target and so on.
Tantalum sputtering target, Tantalum target
Material: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)
Size:
circular targets: Diameter 25mm up to 400mm x Thickness 3mm up to 28mm
rectangular targets: Thickness 1mm up to 12.7mm x Width up to 600mm x Length
up to 2000mm
Purity: >=99.95% or 99.99%
Grade : 3N, 3N5, 4N, with Ta 99.99%min Recrystallization : 95%min Grain size : ASTM 6 or finerSurface finish: 16Rms max. or Ra 0.4 ( RMS64 or better) Flatness : 0.1mm or 0.15% max.
Special requirements to be agreed on by the supplier and buyer of negotiations.
The Special sizes are available upon customer’s requirement.
Tantalum Coating Target, Tantalum sputtering target
