Gallium oxide GZO sputtering target
Gallium oxide GZO sputtering target Ga2O3 High density, high even, low electric resistance sputtering process is stability
Gallium oxide GZO sputtering target
the purity is more than 99.99% ,
the relative density is more than 99%.
The size is as following:
The plate sputtering target:
all size within 600*300mm*20mm
The cylinder sputtering target:
the diameter:50-400mm
the thickness:5-20mm
the height:50-500mm.Gallium oxide GZO sputtering target
