Sapphire Ingot in LED wafer
Material | Mono-crystalline Sapphire (Al2O3) | |
Growth Method | Kyropulos or other growth methods on agreement | |
Purity | >= 99.996% (Ti content <=4 ppm) | |
2 inch diameter | 3 and 4 inch | |
Orientation | C-plane(0001) ±1° | C-plane(0001) ±0.5° |
Primary Flat Orientation | A-plane ±1° | A-plane ±1° |
Primary Flat Length (mm) | 16 ±1 | 22±1 |
Secondary Flat | On request | On request |
Diameter (mm) | 50.8 ±0.05 | Dia76.2 or 101.6±0.05 |
Thickness (μm) | >=100 | >=100 |
Surface Roughness Ra (μm) | W20 carborundum grind | W20 carborundum grind |
Chips (flaws) | < 0.2 and 3places | < 0.2 and 4 places |
Crystal Defects (inclusions, twins, cracks, bubbles, scattering centers) | None | None |
Treatments | High temperature annealed | no crystal coloration |
Sapphire Ingot