GZO sputtering target
GZO sputtering target High density, high even, low electric resistance, sputtering process is stability
GZO sputtering target
the purity is more than 99.99% ,
the relative density is more than 99%.
The size is as following:
The plate sputtering target:
all size within 600*300mm*20mm
The cylinder sputtering target:
the diameter:50-400mm
the thickness:5-15mm
the height:50-500mm.
GZO sputtering target
