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Tantalum target, Tantalum sputtering target
Tantalum target, Tantalum sputtering target

we are speialized in tantalum products. Material: Tantalum disk, target Grade: RO5200,RO5252,RO5255 Purity: 99.99% or 99.95%

 We can supply the detail of tantalum dicsk as follows:

Tantalum sputtering targets (disk),Tantalum- tungsten Alloy targets(disk)

Material:            RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)

Size:

circular targets:      Diameter  25mm up to 400mm x Thickness 3mm up to 28mm

rectangular targets:    Thickness 1mm up to 12.7mm x Width up to 600mm x Length up to 2000mm

Purity:  >=99.95%  or  99.99%

Table 1: technology parameter

Grade

3N, 3N5, 4N, with Ta 99.99%min

Recrystallization

95%min

Grain size

ASTM 4 or finer

Surface finish

16Rms max. or Ra 0.4 ( RMS64 or better)

Flatness

0.1mm or 0.15% max

Tolerance

+/-0.010" on all dimensions

Table 1:Chemical composition:

CS                                                  %

Designation

Chief component

Impurities   maxmium

Ta

Nb

Fe

Si

Ni

W

Mo

Ti

Nb

O

C

H

N

Ta1

Remainder

0.004

0.003

0.002

0.004

0.006

0.002

0.03

0.015

0.004

0.0015

0.002

Ta2

Remainder

0.01

0.01

0.005

0.02

0.02

0.005

0.08

0.02

0.01

0.0015

0.01

Special requirments to be agreed on by the supplier and buyer of negotiation

The unlisted sizes are available upon customer’s requirement.

Tantalum target, Tantalum sputtering target

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