lower particle generation;
high tenacity
lower extractable
higher absorbency
exceptional purity, cleanliness, and softness
SMT wiping cloth, engineered for SMT printing cleaning use; and contamination control wipes,engineered for cleanroom use,can be made a variety of size,meet the stringent requirements of the aerospace,optical,and pharmaceutical industries.These wiping cloth and wipes hav proven performance advantages in disk,semiconductor,and medical manufacturing because of their: lower particle and fibers generationlower extractable,Harmless surfacehigher absorbency,Good air permeability,Chemical resistant Available with gamma ray sterilizationexceptional purity, cleanliness, and softness |
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| SMT Understencil Wiping Rolls |
| | Weight(gsm) | Width(mm) | Length(M) | Printing Machine | | 56 | 300 | 10.5 | MPM | | 56 | 350 | 10.5 | | | 56 | 445 | 10.5 | | | 68 | 445 | 10.5 | | | 56 | 480 | 10.5 | | | 56 | 300 | 7 | DEK | | 56 | 350 | 10 | | | 56 | 400 | 7 | | | 56 | 400 | 9 | | | 56 | 430 | 10 | | | 56 | 490 | 7 | | | 56 | 490 | 10 | | | 56 | 510 | 9 | | | 56 | 510 | 10 | | | 55 | 510 | 10 | | | 56 | 520 | 7 | | | 56 | 530 | 12 | | | 55 | 530 | 12 | | | 56 | 270 | 10 | MINAMI | | 56 | 350 | 10 | | | 56 | 380 | 6 | | | 56 | 400 | 6 | | | 56 | 340 | 12 | KME | | 56 | 340 | 20 | | | 56 | 340 | 24 | | | 56 | 480 | 18 | | | 56 | 390 | 8 | EARK | | 56 | 260 | 15 | PANA | | 56 | 350 | 12 | | | 56 | 350 | 15 | | | 56 | 360 | 34 | | | 56 | 400 | 10 | | | 56 | 430 | 10 | | | 56 | 500 | 10 | | | 56 | 500 | 20 | | | 56 | 510 | 20 | | | 56 | 520 | 34 | | | 56 | 372 | 10 | PANASONIC | | 56 | 372 | 24 | | | 56 | 580 | 8.5 | FUJI | | 56 | 420 | 10 | YAMAHA | | 56 | 420 | 20 | | | 56 | 420 | 40 | |
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SMT understencil wiping roll
