VF1200X is a vacuum chamber furnace
Detailed Product Description
Features:
- High quality Ni-Cr-Al resistance wire as heating element and can be heated up to 1200oC
- High purity quartz liner : 8" O.D. x 7.5" I.D x 13.2" Height ( 205 OD x 190 ID x 340 H mm )
- Stainless steel vacuum flange with one two ball valves and vacuum gauge is included for immediate use.
- Built in precision digital temperature controller is 30 segments programmable to control heating rate, cooling rate and dwell time
- All accessories are included for immediate use
- One pcs refractory disk which shall be put top of inside quartz liner to protect stainless steel from heat damage.
- One high temperature gloves using can be used < 900 oC
Specifications: - Working Temp: 100 - 1200 oC ( 1100oC Max. Continuous and 1200oC Max. < 1 hours )
- Refractory Chamber size : 240 dia. x 220 H (9.5"Dia. x 8.6"H)
- Quart Liner size: 205 mm O.D x 190 mm I.D x 340 mm Height
- Vacuum flange: Stainless steel with double high temperature silicone O-ring ( up to 300oC )
Vacuum pressure: Depended on vacuum pump limit. Vacuum pump is not included, please order separately ( click underlined to choose ) For high vacuum, please choose ( click underlined to order separately )
Gas flow and pressure: Inert gas and oxygen gas flow can be achieved via two valves. Max. gas pressure shall be less than 1.2 atm You may choose to monitor flow rate ( click under lined to order separately) If use hydrogen gas, the furnace must be placed under fume hood or safe place
Temperature controller: 30 segments programmable with accuracy +/-1.0 oC with bright LED digital control panel - Uniformity: +/- 2 oC
- Power: Single phase 240 VAC / 50/60Hz , 3000 W max. ( 20 A breaker required )
- Overall Dimension: 510 x 435 x 425 mm
- Net Weight: 35 Kg
- Shipping weight: 120 lbs
- Shipping volume: 45x28x35"
Applications: - Calcine high purity compound under vacuum or inert gas
- Anneal or diffusion semiconductor wafer up to 6 " diameter
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