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Aluminum fluoride, 7784-18-1, AlF3, MW 83.98 is a white crystalline powder that is slightly soluble in water. Aluminum Fluoride is 95+% pure. Aluminum fluoride is used in the production of aluminum to lower the melting point. Aluminum fluoride is also used as a flux in ceramic glazes and enamels, manufacturing aluminum silicate, and as a catalyst.
Properties of Aluminum fluoride:
Appearance/Form: White crystalline powderFormula: AlF3Molecular Weight: 83.98pH: 5.9 at 20 °C (68 °F)Density: 3.1 g/mL at 25 °C (77 °F)Solubility: Slightly soluble in waterOther: Sublimes at approximately 1250 °C
Purity: 95+%Storage: Keep in a tightly closed container. Store in a dry well-ventilated place.Special Requirements: Avoid formation of dust and aerosols. Provide appropriate exhaust ventilation where dust may be formed.
Use of Aluminum fluoride:
Productions of aluminum to lower the melting point and increase the conductivity of the electrolyte, flux ceramic glazes and enamels, manufacture of aluminum silicate, and as a catalyst
Aluminum Fluoride, AlF3 for Optical Coating
Fluoride compounds are used in coatings for the UV to middle-IR regions. They provide the lowest refractive indices and therefore are essential components of anti-reflective coatings. Fluoride films display absorption bands in the IR regions 2.8-3.2 µm and 6.0-7.4 µm to varying depths, depending on the compound and the deposition method and parameters. High substrate temperatures, E-beam and IAD are methods that reduce the depths of the absorptions.
Aluminum fluoride, AlF3, is a well-known material which has previously been used as a coating material where a low index was required.* It is not affected by water and has good mechanical strength.
Applications of Aluminum Fluoride AlF3
AlF3 is used as a coating material for mirrors in excimer lasers. Excimer laser technology has applications in angioplasty in medicine and lithography in semiconductor processing.
Physical Properties of Solid Material Aluminum Fluoride AlF3
Evaporation Parameters of Aluminum Fluoride AlF3
AlF3 was test evaporated with an electron beam from graphite crucibles. The material was preconditioned for 5-15 minutes to dehydrate the particle surfaces and to create a melted, dense surface. AlF3 evaporated smoothly at 10-6 Torr at low E-beam power. No spitting occurred, and the vacuum pressure continued to decrease, indicating that no volatiles or water vapor were being emitted. A deposition rate of 10-20 Å/sec. and a substrate temperature of equal or greater than 250°C are suggested for highest density, water resistance and hardness.
Film Properties of Aluminum Fluoride AlF3
Chemical Constituent(mass fraction)%
Loss of Ignition
AlF3 coatings have a very low index compared with other fluorides. A loss of ~2% in transmission at wavelengths near 400 nm is attributed to a partial deficiency of fluorine content caused by decomposition in the E-beam evaporation. This depletion is aggravated by high energy processes, such as ion assisted deposition (IAD). The effect is minimal with resistance heated evaporation. Since the test evaporated film layer was ~1500 nm thick, this deficiency would be undetectable in the UV, where applications require layers one-tenth this thickness. AlF3 has promise for IR use although its absorption in the 10 µm region might be a little higher than desirable for high energy applications. The durability and adhesion of AlF3 films proved to be excellent. In the UV, AlF3 is finding applications in high energy laser coatings at wavelengths below 250 nm.
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