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Low emissivity glass machine
Low emissivity glass machine

Detailed Product Description


We have long term cooperation with top domestic universities and national laboratory, we also have regular communication with world related institutes, which renders our technological level at the top of the world. Now we can provide high quality Low-E coating production line with max. substrate size 2540mm×3660mm and production capacity over 3 million m2 per year.

Technology-based military equipment manufacturing process, making the vacuum equipment to effectively safeguard the quality of processing.

Adopt dual target intermediate frequency or rotation cathode magnetron reaction sputtering technology, make the sputtering of mediun film easily.

Advanced PEM closed loop coating control technology ensure reaction sputtering in metal transition zone, improve sputtering efficiency and accuracy of film material.

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