1Automatic uninterrupted sputtering 2 graphical interface operation 3 feedback control 4 Large scale deposition line
Feature:
1 Plane magnetron sputtering cathode of high target utilization,novel transport device.
2 Good interval gas isolation design,guarantee the reactive deposion be uniform stable.
3 Large scale deposition line,large area deposition.
4 Small workpiece rotated itself,ensure three-dimentional deposition uniform stable.
5 High productivity,low consumption,save manpower.
6 According to workpiece,it divided into Vertical structure and Horizontal structure.
Application:
Hardware,Sanitary Ware,Glass plastic jewelry,Mobile,Collector tube,Organic sheet,Glass plates,Low-E glass,Curtain wall glass,ITO glass,rearview mirror,Color panel
VAKIA-ILC horizontal inline magnetron sputtering coating system
