1.Thick Film ALN Ceramic Substrate 2.High-efficient, low cost, pollution-free 3.High thermal conductivity,Good insulation
Thick Film ALN Ceramic Substrate
1. High-efficient, low cost, pollution-free thermal technology of doctor-blading process for ceramic substrates
2. AlN ceramic substrates with high thermal conductivity and electrical ceramic components
3. Aluminum nitride substrate specifications
Regular size : 50.8×50.8 76.2×76.2 101.6×101.6 114.3×114.3mm
Thickness :0.2-1.5mm
Φ 20mm - Φ114mm
Thickness:1-10mm
4. Appearance specifications thickness can be according to the customer request processing
5. Surface roughness Ra≤0.05um
6. The surface can be covered a layer of Cu ,silver and etc.
Thick Film ALN Ceramic Substrate
