TiAl Target TiAl alloy sputtering target
TiAl Target Used as sputtering target Atom Ration:50:50,75:25 or customer designs Purity:99.8% min Relative Density:3.7g/cm3
TiAl Target
Used as sputtering target for coating tools
Atom Ration: 50:50, 75:25 or according to customer designs
Purity: TiAl 99.8% min.
Relative Density: 98%
Roughness: 3.2um
Pressing Method: Smelting, HIP
TiAl Target TiAl alloy sputtering target
